345 Relief Cream Mask

Description: The Dr.Althea 345 Relief Cream Mask is a specialized sheet mask designed for rapid skin recovery and blemish relief. Built as a concentrated version of the brand’s cult-favorite 345 Relief Cream, this mask features a unique "3-4-5" formulation strategy: 3 blemish-relief ingredients, 4 nourishing ingredients, and 5 soothing care components. It utilizes 30% Tea Tree Leaf Water and three different Centella-derived extracts to reduce redness and inflammation significantly. The essence is delivered via a high-adherence vegan cellulose sheet, which ensures that the active ingredients are absorbed deeply into the skin without leaving a heavy residue. It is particularly effective for post-acne care, helping to fade marks and repair the skin barrier. Recommended for: Dry, sensitive skin, and all skin types (especially acne-prone or irritated skin). How to use: Cleanse your face and prep the skin with a toner. Remove the sheet mask from the pouch and carefully unfold it. Apply the mask evenly over the face, ensuring good contact with the skin. Leave it on for 10–15 minutes. Remove the mask and gently pat the remaining cream essence into the skin until fully absorbed. Ingredients: Water, Tea Tree Leaf Water, Methylpropanediol, 1,2-Hexanediol, Butylene Glycol, Glycerin, Niacinamide, Octyldodeceth-16, Triethylhexanoin, Caprylic/Capric Triglyceride, Pentylene Glycol, Carbomer, Hydroxyethylcellulose, Tromethamine, Allantoin, Trehalose, Caprylyl Glycol, Ethylhexylglycerin, Dipotassium Glycyrrhizate, Disodium EDTA, Panthenol, Soybean Seed Extract, Sodium Hyaluronate, Hydrolyzed Hyaluronic Acid, Pantothenic Acid, Centella Asiatica Leaf Water, Cyclodextrin, Centella Asiatica Extract, Hydrogenated Lecithin, Madecassoside, Ceramide NP, Cholesterol, Camellia Sinensis Leaf Water, Resveratrol, Beta-Glucan, Sodium DNA, Nelumbo Nucifera Leaf Extract